In the production of chips, it is important that the film of insulation be a uniform thickness, or else the chip is no good. As it turns out, a small difference in film thickness makes a big difference in the reflectivity of the film. What that means is that measuring the reflectivity of the film can tell you how thick it is. This is important to manufacturers because they can create just the right film thickness by depositing SiO2 until it reaches the correct reflectivity. A procedure such as this would cut production costs and reduce the amount of computer chip waste.
This experiment is intended to produce data on polished wafers of silicon, germanium, and a combination of the two. Data will also be taken on some experimental Simox wafers and on some Ronchi ruled reticles. Reticles are glass slides with thin parallel chrome lines deposited on them. They are used as guides in etching lines on wafers.
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